GateKeeper® Corrosive (C-HCI / C-XPC) Gas Purifiers
Cost-effective gas purification
● Consistently delivers ultrapure gas
● Designed for use with HCl, Cl2, HBr, BCl3, SiCl4 and SiF4. The purifiers remove moisture to <1 ppb (part-per-billion) in N2.
● Guards against bulk gas purifier breakthrough, impurity spikes from liquid storage tanks, cylinder changeouts and unexpected contaminants in the process
● Does not release hydrocarbons that may contaminate the process
● Uses ambient temperature purification technology – no power or heat required
● Low pressure drop across purifiers
檔案下載:
(C-HCI) (C-XPC)
規格說明:
Cost-effective gas purification
● Consistently delivers ultrapure gas
● Designed for use with HCl, Cl2, HBr, BCl3, SiCl4 and SiF4. The purifiers remove moisture to <1 ppb (part-per-billion) in N2.
● Guards against bulk gas purifier breakthrough, impurity spikes from liquid storage tanks, cylinder changeouts and unexpected contaminants in the process
● Does not release hydrocarbons that may contaminate the process
● Uses ambient temperature purification technology – no power or heat required
● Low pressure drop across purifiers
檔案下載:
(C-HCI) (C-XPC)
規格說明:
Materials of construction: | 316L stainless steel, electropolished 10 Ra |
Media: | Inorganic |
Gases purified: | HCl, Cl2, HBr, BCl3, SiCl4, SiF4 |
Outlet purity: | <1 ppb H2O in N2 |
Outlet particle filtration: | 0.003 μm |
Maximum differential pressure: | 1379 kPa (200 PSID) |
Minimum operating pressure: | 101 kPa (14.7 PSIA) |
Maximum flow rates: | See datasheet. |
Leak rating: | 1 × 10-9 atm cc/sec. |
Maximum inlet challenge of contaminant to maintain product efficiency: | 10 ppm (part-per million) |
Lifetime: | One year at nominal flow rate with 1 ppm inlet challenge of moisture |
Maximum operating temperature: | 65°C (149°F) |