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Wafergard® III NF Micro In-Line Gas Filters

Wafergard® III NF Micro In-Line Gas Filters

Superior particulate filtration for ultrapure gas system filtration
 

● Cleanest, most efficient all-metal filters available
● Patented nickel filter membrane offers superior corrosion resistance and excellent compatibility with inert and reactive gases. (Not recommended for use with CO, O3 and low-level hydride dopant gases.)
● Ideal for high-temperature and dynamic-pressure applications


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Materials:
Filter element: Patented, sintered nickel membrane filter.
Housing: Electropolished F20 stainless steel housing
Surface finish interior: <=5 μin Ra
Helium leak rating: Qualified 2`10-10 atm-cc/sec. Tested 1`10-9 atm-cc/sec.

 
Downstream cleanliness:
Particles1: Less than 0.03 particles/liter (<1 particle/ft3) greater than 0.01 μm
Volatiles2 : Volatile outgassing of H2O, O2 and THC is below detectable limits (by RGA and FID at room temperature)

 
Removal rating:
>=0.003 μm
 
Particle retention:
Greater than 99.9999999% (9 LRV) removal of all particles (referenced at the most penetrating particle size)
 
Operating conditions
Maximum inlet pressure: 207 bar (3000 PSI) @100°C
Maximum forward/reverse differential pressure: 35 bar (500 PSID)
Maximum operating temperature: Inert gases 400°C at 35 bar (500 PSI) Corrosive and reactive gases 50°C at 70 bar (1000 PSI)

 
Warranty:
5 year
 
Notes:
1) Particle cleanliness qualified following SEMASPEC Test Method for Particle Shedding (#93021511A-STD)
2) Volatile cleanliness qualified following SEMASPEC Test Methods for: THC Contribution (#90120396B-STD), Moisture Contribution (#90120397B-STD) and Oxygen Contribution (#90120398B-STD).

 

 

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