Wafergard® III NF Micro In-Line Gas Filters
Superior particulate filtration for ultrapure gas system filtration
● Cleanest, most efficient all-metal filters available
● Patented nickel filter membrane offers superior corrosion resistance and excellent compatibility with inert and reactive gases. (Not recommended for use with CO, O3 and low-level hydride dopant gases.)
● Ideal for high-temperature and dynamic-pressure applications
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規格說明:
Superior particulate filtration for ultrapure gas system filtration
● Cleanest, most efficient all-metal filters available
● Patented nickel filter membrane offers superior corrosion resistance and excellent compatibility with inert and reactive gases. (Not recommended for use with CO, O3 and low-level hydride dopant gases.)
● Ideal for high-temperature and dynamic-pressure applications
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規格說明:
Materials: |
Filter element: Patented, sintered nickel membrane filter. Housing: Electropolished F20 stainless steel housing Surface finish interior: <=5 μin Ra Helium leak rating: Qualified 2`10-10 atm-cc/sec. Tested 1`10-9 atm-cc/sec. |
Downstream cleanliness: |
Particles1: Less than 0.03 particles/liter (<1 particle/ft3) greater than 0.01 μm Volatiles2 : Volatile outgassing of H2O, O2 and THC is below detectable limits (by RGA and FID at room temperature) |
Removal rating: |
>=0.003 μm |
Particle retention: |
Greater than 99.9999999% (9 LRV) removal of all particles (referenced at the most penetrating particle size) |
Operating conditions |
Maximum inlet pressure: 207 bar (3000 PSI) @100°C Maximum forward/reverse differential pressure: 35 bar (500 PSID) Maximum operating temperature: Inert gases 400°C at 35 bar (500 PSI) Corrosive and reactive gases 50°C at 70 bar (1000 PSI) |
Warranty: |
5 year |
Notes: |
1) Particle cleanliness qualified following SEMASPEC Test Method for Particle Shedding (#93021511A-STD) 2) Volatile cleanliness qualified following SEMASPEC Test Methods for: THC Contribution (#90120396B-STD), Moisture Contribution (#90120397B-STD) and Oxygen Contribution (#90120398B-STD). |