Etchgard™ HP and HPX Cartridge Filters
Filtration of copper deposition solution with high flow rate performance and reliable contaminant retention capabilities in 10 -180 nm technology nodes.
Etchgard™ HP and HPX Cartridge Filters
● Industry: Semiconductor, LED
● Process: Wet Clean and Clean, Deposition
● Chemistry: Dilute Acids, Dilute Bases, Deposition
● Installation Point: Point of Tool
Product Documentation
Product Specifications
Filtration of copper deposition solution with high flow rate performance and reliable contaminant retention capabilities in 10 -180 nm technology nodes.
Etchgard™ HP and HPX Cartridge Filters
● Industry: Semiconductor, LED
● Process: Wet Clean and Clean, Deposition
● Chemistry: Dilute Acids, Dilute Bases, Deposition
● Installation Point: Point of Tool
Product Documentation
Product Specifications
| TORRENTO ATE/AT3 | TORRENTO 1500/3000 | ||
| Materials: | Membrane: | Prewet, nondewetting PTFE | |
| Supports | PFA | ||
| Catridge o-ring options |
E-FKM, Chemraz® or Kalrez®, Viton® Extreme™ ETP |
- | |
| Shell | PFA | ||
| Retention rating: | 10 nm | 15 nm | |
| 20 nm | |||
| Membrane area: | 10" | ATE 10" 2 m² (21 ft²) | 1500 type 0.19 m² (2.05 ft²) |
| ATE 20" 4 m² (42 ft²) | 3000 type 0.44 m² (4.74 ft²) | ||
| ATF 10" 3 m² (32 ft²) | |||
| ATF 20" 6 m² (64 ft²) | |||
| Maximum operating conditions: | Maximum operating pressure: | 0.58 MPa (5.8 bar; 84 psi) @ 25°C (77°F) | 0.44 MPa (4.4 bar, 64 psi) @ 25°C (77°F) |
| 0.097 MPa (0.97 bar; 14 psi) @ 200°C (392°F) | 0.19 MPa (1.9 bar, 28 psi) @ 95°C (203°F) | ||
| Maximum forward differential pressure | 0.44 MPa (4.4 bar; 64 psi) @ 25°C (77°F) | 0.39 MPa (3.9 bar; 57 psi) @ 25°C (77°F) | |
| 0.05 MPa (0.52 bar, 7.5 psi) @ 180°C (356°F) | 0.19 MPa (1.9 bar; 28 psi) @ 95°C (203°F) | ||
| Maximum reverse differentialpressure | 0.34 MPa (3.45 bar, 50 psi) @ 25°C (77°F) | 0.29 MPa (2.9 bar; 42 psi) @ 25°C (77°F) | |
| Maximum operating temperature: | 180°C (356°F) | 95°C (203°F) | |
| Metallic extractables: | Standard | Testing conducted for 12 metals | |
| Standard | Testing conducted for 16 metals | ||
| Particle sheddings cleanliness: |
<15 particles/10 mL ≥ 0.2 µm @ 5 L/min Dl water flow |
<10 particles/10 mL ≥ 0.2 µm @ 5 L/min Dl water flow |
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"Per 10" cartridge equivalent |
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