Intercept® HP, HPX, HPM and HSM Cartridge Filters
Hydrophilic dual-capture membrane for superior particle removal in batch baths, single wafer tools, and chemical delivery systems in a high-flow filter
Hydrophilic dual-capture membrane for superior particle removal in batch baths, single wafer tools, and chemical delivery systems in a high-flow filter
● Dual-particle capture mechanism - patented hydrophilic membrane structure provides enhanced particle removal capabilities
● High flow hydrophilic membrane with large filtration area provides rapid particle removal and microbubble control for faster bath startup/system qualification and increased yields
● Extreme cleanliness in terms of particle shedding and metal extractables
● High sieving retention at filter's rating
● Available in a variety of retention ratings from 0.2 µm down to 20 nm to cover a broad scope of process requirements
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Specifications：
| Materials: |
Membrane: - HP, HPX and HPM: Hydrophilic ultra-high molecular weight polyethylene (UPE) - HSM: Hydrophilic Polysulfone (PS) Supports, core and sleeve: High-density polyethylene (HDPE) Disposables' outer shell: - Chem-Line™ II: Polypropylene - Chem-Line I: PFA Flaretek® nuts: PVDF Cartridges: Code 0 double 2-222 o-rings: Teflon® Encapsulated Viton® (TEV) or Kalrez® 4079 |
| Fittings: |
Chem-Line II: Inlet/outlet: 3/8", 1⁄2", 3⁄4” or 1” Flaretek® fittings or compatible Chem-Line I: Inlet/outlet: T-line 3/4" Super Type Pillar® and 3/4" or 1" Super 300 Type Pillar Vents and drains: 1/4” Flaretek® fittings or compatible |
| Membrane area: |
HP 10": 0.85 m2 HPX 4": 0.5 m2; HPX 10": 1.1 m2; HPX 20": 2.2 m2 HPM 10": 1.9 m2 HSM 10": 1.05 m2 |
| Maximum operating conditions: |
Maximum forward differential pressure: 0.34 MPa (3.4 bar, 50 PSID) at 25°C; 0.21 MPa (2.1 bar, 30 PSID) at 70°C Maximum reverse differential pressure: 0.21 MPa (2.1 bar, 30 PSID) @ 25°C Maximum operating temperature: 70°C (at the above conditions) |
