IntelliGen™ Mini and Impact® Mini Photo Chemical Dispense and Filtration
Precision, two-stage dispense system for advanced photochemicals
● Delivers ultimate defect reduction in point-of-use photochemical dispense applications
● Patented advanced two-stage dispense technology isolates filtration from dispense, maximizing defect reduction and improving yield without sacrificing dispense repeatability
● A 50% footprint reduction saves valuable space in track equipment and enables two-stage performance in the same space as a single stage pump
● Fill rate control and real-time pressure control maximize filter performance and prevent microbubble formation in even the most sensitive photochemicals
● Dispense confirmation provides alarm notification of a partial or failed dispense, preventing costly wafer scrap due to coating problems
● Constant pressure filtration optimizes filtration, minimizing defects and increasing yield
● Brushless DC motor with closed-loop control delivers extreme repeatability at dispense rates down to 0.1 ml/sec
● Disposable, self-contained Impact® 2 OF or Impact® Mini OF filters provide a clean connection and rapid filter change out
● Volume-based vent control is more precise than time-based vent control and reduces chemical waste
● PTFE-wetted surfaces maintain photochemical purity and provide chemical resistance
Download：
Specifications：
Precision, two-stage dispense system for advanced photochemicals
● Delivers ultimate defect reduction in point-of-use photochemical dispense applications
● Patented advanced two-stage dispense technology isolates filtration from dispense, maximizing defect reduction and improving yield without sacrificing dispense repeatability
● A 50% footprint reduction saves valuable space in track equipment and enables two-stage performance in the same space as a single stage pump
● Fill rate control and real-time pressure control maximize filter performance and prevent microbubble formation in even the most sensitive photochemicals
● Dispense confirmation provides alarm notification of a partial or failed dispense, preventing costly wafer scrap due to coating problems
● Constant pressure filtration optimizes filtration, minimizing defects and increasing yield
● Brushless DC motor with closed-loop control delivers extreme repeatability at dispense rates down to 0.1 ml/sec
● Disposable, self-contained Impact® 2 OF or Impact® Mini OF filters provide a clean connection and rapid filter change out
● Volume-based vent control is more precise than time-based vent control and reduces chemical waste
● PTFE-wetted surfaces maintain photochemical purity and provide chemical resistance
Download：
Specifications：
| Dispense Performance | |
| Dispense repeatability: | <0.02 ml in 3 sigma |
| Dispense volume: | 0.1 - 10.0 ml in 0.001 increments |
| Dispense rate: | 0.1-3.0 ml/sec. in 0.001 ml/sec. |
| Viscosity range: | 1-100 cP |
| Filtration Performance | |
| Retention rating: | 20nm |
| Compatibility: | PGMEA, PGME, Ethyl lactate, MMP and cylcohexanone. Not recommended for use with photochemicals containing aromatic hydrocarbons. |
| Wettability: | Spontaneously wets in Butyl acetate PGMEA, PGME, Ethyl lactate, MMP, ECA, NMP and other photochemical solvents |
| Hold-up volume: | <15 cc |
| Filter changeout: | Entegris Connectology® connection allows rapid filter changeout with no tools in less than one minute |
