Torrento® AT Filter
Advanced filtration of aqueous, outgassing, and aggressive acid and base chemistries with high flow rate and retention performance in 28 - 65 nm technology nodes.
Torrento® AT Filter
● Industry: Semiconductor
● Process: Wet Etch and Clean
● Chemistry: Aggressive Acids, Aggressive Bases, Resist Stripper
● Installation Point: Point of Tool, Point of Dispense, Bulk
Product Documentation
Product Specifications
Advanced filtration of aqueous, outgassing, and aggressive acid and base chemistries with high flow rate and retention performance in 28 - 65 nm technology nodes.
Torrento® AT Filter
● Industry: Semiconductor
● Process: Wet Etch and Clean
● Chemistry: Aggressive Acids, Aggressive Bases, Resist Stripper
● Installation Point: Point of Tool, Point of Dispense, Bulk
Product Documentation
Product Specifications
TORRENTO ATE/AT3 | TORRENTO 1500/3000 | ||
Materials: | Membrane: | Prewet, nondewetting PTFE | |
Supports | PFA | ||
Catridge o-ring options |
E-FKM, Chemraz® or Kalrez®, Viton® Extreme™ ETP |
- | |
Shell | PFA | ||
Retention rating: | 10 nm | 15 nm | |
20 nm | |||
Membrane area: | 10" | ATE 10" 2 m² (21 ft²) | 1500 type 0.19 m² (2.05 ft²) |
ATE 20" 4 m² (42 ft²) | 3000 type 0.44 m² (4.74 ft²) | ||
ATF 10" 3 m² (32 ft²) | |||
ATF 20" 6 m² (64 ft²) | |||
Maximum operating conditions: | Maximum operating pressure: | 0.58 MPa (5.8 bar; 84 psi) @ 25°C (77°F) | 0.44 MPa (4.4 bar, 64 psi) @ 25°C (77°F) |
0.097 MPa (0.97 bar; 14 psi) @ 200°C (392°F) | 0.19 MPa (1.9 bar, 28 psi) @ 95°C (203°F) | ||
Maximum forward differential pressure | 0.44 MPa (4.4 bar; 64 psi) @ 25°C (77°F) | 0.39 MPa (3.9 bar; 57 psi) @ 25°C (77°F) | |
0.05 MPa (0.52 bar, 7.5 psi) @ 180°C (356°F) | 0.19 MPa (1.9 bar; 28 psi) @ 95°C (203°F) | ||
Maximum reverse differentialpressure | 0.34 MPa (3.45 bar, 50 psi) @ 25°C (77°F) | 0.29 MPa (2.9 bar; 42 psi) @ 25°C (77°F) | |
Maximum operating temperature: | 180°C (356°F) | 95°C (203°F) | |
Metallic extractables: | Standard | Testing conducted for 12 metals | |
Standard | Testing conducted for 16 metals | ||
Particle sheddings cleanliness: |
<15 particles/10 mL ≥ 0.2 µm @ 5 L/min Dl water flow |
<10 particles/10 mL ≥ 0.2 µm @ 5 L/min Dl water flow |
|
"Per 10" cartridge equivalent |