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Eximor® SV1 Filter

Eximor® SV1 Filter
 
Advanced clean, point-of-use filter designed for NTD and RRC solvents. Provides superior contaminant retention capabilities and rapid start-up performance in sub-28 nm technology nodes.
 
Eximor® SV1 Filter
● Industry: Semiconductor
● Process: Photolithography
● Chemistry: Solvent
● Installation Point: Point of Tool

Product Documentation  


Product Specifications

Materials: Membrane Ultra-high molecular weight polyethylene (UHMWPE)
  Shell, core, supports High-density polyethylene (HDPE)
  O-ring (OF) Kalrez® perfluoroelastomer
Maximum operating conditions: Maximum inlet pressure 0.34 MPa (3.4 bar, 50 psi) @ 25°C (77°F)
  Maximum forward/reverse differential pressure 0.27 MPa (2.7 bar, 39 psi) @ 25°C (77°F)
  Maximum operating temperature 40°C (104°F)
Compatibility: Cyclohexanone (CHN), methyl amyl ketone (MAK), n-butyl acetate (nBA), ethyl lactate (EL), propylene glycol methyl ether acetate (PGMEA), propylene glycol monomethyl ether (PGME), any blend of PGME/PGMEA
Hold up volume: 110 cc  
Typical flow rate: 250 cc/min (20°C, 1 mPa•s) with 0.03 MPa pressure drop