Eximor® SV1 Filter
Advanced clean, point-of-use filter designed for NTD and RRC solvents. Provides superior contaminant retention capabilities and rapid start-up performance in sub-28 nm technology nodes.
Eximor® SV1 Filter
● Industry: Semiconductor
● Process: Photolithography
● Chemistry: Solvent
● Installation Point: Point of Tool
Product Documentation
Product Specifications
Advanced clean, point-of-use filter designed for NTD and RRC solvents. Provides superior contaminant retention capabilities and rapid start-up performance in sub-28 nm technology nodes.
Eximor® SV1 Filter
● Industry: Semiconductor
● Process: Photolithography
● Chemistry: Solvent
● Installation Point: Point of Tool
Product Documentation
Product Specifications
| Materials: | Membrane | Ultra-high molecular weight polyethylene (UHMWPE) |
| Shell, core, supports | High-density polyethylene (HDPE) | |
| O-ring (OF) | Kalrez® perfluoroelastomer | |
| Maximum operating conditions: | Maximum inlet pressure | 0.34 MPa (3.4 bar, 50 psi) @ 25°C (77°F) |
| Maximum forward/reverse differential pressure | 0.27 MPa (2.7 bar, 39 psi) @ 25°C (77°F) | |
| Maximum operating temperature | 40°C (104°F) | |
| Compatibility: | Cyclohexanone (CHN), methyl amyl ketone (MAK), n-butyl acetate (nBA), ethyl lactate (EL), propylene glycol methyl ether acetate (PGMEA), propylene glycol monomethyl ether (PGME), any blend of PGME/PGMEA | |
| Hold up volume: | 110 cc | |
| Typical flow rate: | 250 cc/min (20°C, 1 mPa•s) with 0.03 MPa pressure drop | |
