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Microgard™ UC Filter

Microgard™ UC Filter
 
Best-in-class, clean, bulk photochemical filter, providing superior flow rate performance and excellent contaminant retention capabilities in sub 10 nm technology nodes.

 
Delivers contamination control in bulk photochemical manufacturing and solvent-based photolithography applications
 
Advanced device design enables higher chemical throughput and flow rate performance
 
● Available in ultraclean or standard clean versions which reduce particle shedding and metal and organic extractables in sub-28 nm nodes
 
● A higher throughput (HT) design is available for select 10" and 20" filter types

  
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規格說明 


Materials of construction:
Membrane:
Asymmetric UPE
Clean Material Resin
 
Supports, core, sleeve:
High density polyethylene (HDPE)
 
O-ring:
E-FKM (AS568-222)

 
Operating conditions:
Maximum inlet pressure:
0.34 MPa (3.4 bar, 50 psi) @ 25°C (77°F)
 
Maximum forward/reverse differential pressure:
0.24 MPa (2.4 bar, 35 psi) @ 25°C (77°F)
 
Maximum operating temperature:
60°C (140°F)

 
Metallic extractables
Testing conducted for Standard clean:
13 metals

Testing conducted for Ultraclean:
23 metals