Microgard™ UC Filter
Best-in-class, clean, bulk photochemical filter, providing superior flow rate performance and excellent contaminant retention capabilities in sub 10 nm technology nodes.
● Delivers contamination control in bulk photochemical manufacturing and solvent-based photolithography applications
● Advanced device design enables higher chemical throughput and flow rate performance
● Available in ultraclean or standard clean versions which reduce particle shedding and metal and organic extractables in sub-28 nm nodes
● A higher throughput (HT) design is available for select 10" and 20" filter types
Best-in-class, clean, bulk photochemical filter, providing superior flow rate performance and excellent contaminant retention capabilities in sub 10 nm technology nodes.
● Delivers contamination control in bulk photochemical manufacturing and solvent-based photolithography applications
● Advanced device design enables higher chemical throughput and flow rate performance
● Available in ultraclean or standard clean versions which reduce particle shedding and metal and organic extractables in sub-28 nm nodes
● A higher throughput (HT) design is available for select 10" and 20" filter types
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Specifications：
| Materials of construction: |
Membrane: Asymmetric UPE Clean Material Resin Supports, core, sleeve: High density polyethylene (HDPE) O-ring: E-FKM (AS568-222) |
| Operating conditions: |
Maximum inlet pressure: 0.34 MPa (3.4 bar, 50 psi) @ 25°C (77°F) Maximum forward/reverse differential pressure: 0.24 MPa (2.4 bar, 35 psi) @ 25°C (77°F) Maximum operating temperature: 60°C (140°F) |
| Metallic extractables |
Testing conducted for Standard clean: 13 metals Testing conducted for Ultraclean: 23 metals |
