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Fluorogard® NX Filter

Fluorogard® NX Filter


Designed for aggressive aqueous chemicals and solvents, these filters offer a cost-effective alternative for advanced wet etch and clean (WEC) applications.
 
●Retention ratings 10 µm to 15 nm remove particles from a range of acids, bases, and other process chemicals.
●Requires minimal setup time, promoting a lower cost of ownership in advanced WEC processes
●Ideal for medium- to high-flow extended lifetime applications
●Hydrophobic membrane's increased surface area improves flow rate performance with low pressure drop, and enables higher throughput and increased device yield at elevated temperatures
●PTFE/PFA fluorine resin materials are thermally bonded PFA construction ensure excellent chemical compatibility and minimize chloride and metals extractables that can impact process performance
●Cost-effective prewet cartridge filter option ships 0.9% H2O2 wet, which allows rapid startup in aqueous chemicals and prevents alcohol-chemical interactions

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Specifications:

Materials   NXT cartridge NXE cartridge
Membrane Hydrophobic PTFE
Supports, core, sleeve, end caps, Chemlock® key PFA
O-ring options E-FKM, E-ETP, Kalrez®
Retention ratings   0.05, 0.1, 0.2, 0.5, 1.0, 5, 10 µm, 15, 30 nm 0.05, 0.1, 0.2, 0.5 µm, 15, 30 nm
Membrane surface area    4": 0.36 m2 (3.88 ft2) 10": 2.1 m² (22.6 ft²)
  10": 0.9 m2 (9.68 ft2) 20" 4.2 m² (45.21 ft²)
  20": 1.8 m2 (19.38 ft2) 30" 6.3 m2 (67.81 ft2)
  30": 2.7 m2 (29.06 ft2)  
Metallic extractables   Testing conducted for 23 metals
Maximum operating conditions Operating pressure 0.58 MPa (5.8 bar, 84 psi @ 25°C [77°F])
Forward differential pressure 0.44 MPa (4.4 bar, 64 psi @ 25°C [77°F])
  0.05 MPa (0.5 bar, 7.5 psi @ 180°C [356°F])
Reverse pressure 0.34 MPa (3.4 bar, 50 psi @ 25°C [77°F])
Operating temperature 180°C (356°F)
 

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