Fluorogard® NX Filter
Designed for aggressive aqueous chemicals and solvents, these filters offer a cost-effective alternative for advanced wet etch and clean (WEC) applications.
●Retention ratings 10 µm to 15 nm remove particles from a range of acids, bases, and other process chemicals.
●Requires minimal setup time, promoting a lower cost of ownership in advanced WEC processes
●Ideal for medium- to high-flow extended lifetime applications
●Hydrophobic membrane's increased surface area improves flow rate performance with low pressure drop, and enables higher throughput and increased device yield at elevated temperatures
●PTFE/PFA fluorine resin materials are thermally bonded PFA construction ensure excellent chemical compatibility and minimize chloride and metals extractables that can impact process performance
●Cost-effective prewet cartridge filter option ships 0.9% H2O2 wet, which allows rapid startup in aqueous chemicals and prevents alcohol-chemical interactions
Designed for aggressive aqueous chemicals and solvents, these filters offer a cost-effective alternative for advanced wet etch and clean (WEC) applications.
●Retention ratings 10 µm to 15 nm remove particles from a range of acids, bases, and other process chemicals.
●Requires minimal setup time, promoting a lower cost of ownership in advanced WEC processes
●Ideal for medium- to high-flow extended lifetime applications
●Hydrophobic membrane's increased surface area improves flow rate performance with low pressure drop, and enables higher throughput and increased device yield at elevated temperatures
●PTFE/PFA fluorine resin materials are thermally bonded PFA construction ensure excellent chemical compatibility and minimize chloride and metals extractables that can impact process performance
●Cost-effective prewet cartridge filter option ships 0.9% H2O2 wet, which allows rapid startup in aqueous chemicals and prevents alcohol-chemical interactions
Materials | NXT cartridge | NXE cartridge | |
Membrane | Hydrophobic PTFE | ||
Supports, core, sleeve, end caps, Chemlock® key | PFA | ||
O-ring options | E-FKM, E-ETP, Kalrez® | ||
Retention ratings | 0.05, 0.1, 0.2, 0.5, 1.0, 5, 10 µm, 15, 30 nm | 0.05, 0.1, 0.2, 0.5 µm, 15, 30 nm | |
Membrane surface area | 4": 0.36 m2 (3.88 ft2) | 10": 2.1 m² (22.6 ft²) | |
10": 0.9 m2 (9.68 ft2) | 20" 4.2 m² (45.21 ft²) | ||
20": 1.8 m2 (19.38 ft2) | 30" 6.3 m2 (67.81 ft2) | ||
30": 2.7 m2 (29.06 ft2) | |||
Metallic extractables | Testing conducted for 23 metals | ||
Maximum operating conditions | Operating pressure | 0.58 MPa (5.8 bar, 84 psi @ 25°C [77°F]) | |
Forward differential pressure | 0.44 MPa (4.4 bar, 64 psi @ 25°C [77°F]) | ||
0.05 MPa (0.5 bar, 7.5 psi @ 180°C [356°F]) | |||
Reverse pressure | 0.34 MPa (3.4 bar, 50 psi @ 25°C [77°F]) | ||
Operating temperature |
180°C (356°F) |