Guardian™ PS UC Liquid Filters
Provides advanced filtration for low temperature, critical, dilute, aqueous and low-high pH cleaning applications at sub-2x nm technology nodes.
●Available with 1 nm or 5 nm retention rating, which improves single-pass retention efficiency, reduces on-wafer defects, and enables higher yield
●An asymmetric membrane ensures tighter particle retention while maintaining high flow rates
●Ultraclean (UC) filtration technology enables less contamination and faster system flush up while extending tool uptime and increasing device yield
Provides advanced filtration for low temperature, critical, dilute, aqueous and low-high pH cleaning applications at sub-2x nm technology nodes.
●Available with 1 nm or 5 nm retention rating, which improves single-pass retention efficiency, reduces on-wafer defects, and enables higher yield
●An asymmetric membrane ensures tighter particle retention while maintaining high flow rates
●Ultraclean (UC) filtration technology enables less contamination and faster system flush up while extending tool uptime and increasing device yield
規格說明:
Note: Filters are prewet – enclosed in a bag filled with DI water and 0.9% H2O2.
Materials | Membrane | Nondewetting polysulfone (PS) |
Supports, sleeve, core, end caps | High-density polyethylene (HDPE) | |
Code 0 double 2-222 O-rings | Encapsulated fluoropolymer (E-FKM) or Kalrez® 6375 | |
Chem-Line™ II disposable outer shell | Polypropylene (PP) and PFA | |
Chem-Line™ I disposable outer shell | PFA | |
Retention rating | 1 nm, 5 nm | |
Membrane surface area |
10” 1 nm: 1.7 m2 (18.30 ft2) 20" 1 nm: 3.4 m2 (36.60 ft2) |
10" 5 nm: 1.6 m2 (17.22 ft2) 20" 5 nm: 3.2 m2 (34.44 ft2) |
Maximum operating conditions |
Maximum forward differential pressure: 0.34 MPa (3.4 bar; 50 psid) @ 25°C (77°F) |
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Maximum reverse pressure: 0.21 MPa (2.1 bar; 30 psi) @ 25°C (77°F) |
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Maximum operating pressure: 0.58 MPa (5.8 bar; 84 psi) @ 25°C (77°F) |
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Maximum operating temperature: 70°C (158°F) @ 23 psi |
Note: Filters are prewet – enclosed in a bag filled with DI water and 0.9% H2O2.