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Guardian™ PS UC Liquid Filters

Guardian™ PS UC Liquid Filters


Provides advanced filtration for low temperature, critical, dilute, aqueous and low-high pH cleaning applications at sub-2x nm technology nodes.
 
●Available with 1 nm or 5 nm retention rating, which improves single-pass retention efficiency, reduces on-wafer defects, and enables higher yield
●An asymmetric membrane ensures tighter particle retention while maintaining high flow rates
●Ultraclean (UC) filtration technology enables less contamination and faster system flush up while extending tool uptime and increasing device yield


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Specifications:

 
Materials Membrane Nondewetting polysulfone (PS)
Supports, sleeve, core, end caps High-density polyethylene (HDPE)
Code 0 double 2-222 O-rings Encapsulated fluoropolymer (E-FKM) or Kalrez® 6375
Chem-Line™ II disposable outer shell Polypropylene (PP) and PFA
Chem-Line™ I disposable outer shell PFA
Retention rating 1 nm, 5 nm
Membrane surface area 10” 1 nm: 1.7 m2 (18.30 ft2)
20" 1 nm: 3.4 m2 (36.60 ft2)
10" 5 nm: 1.6 m2 (17.22 ft2)
20" 5 nm: 3.2 m2 (34.44 ft2)
Maximum operating conditions Maximum forward differential pressure:
0.34 MPa (3.4 bar; 50 psid) @ 25°C (77°F)
Maximum reverse pressure:
0.21 MPa (2.1 bar; 30 psi) @ 25°C (77°F)
Maximum operating pressure:
0.58 MPa (5.8 bar; 84 psi) @ 25°C (77°F)
Maximum operating temperature:
70°C (158°F) @ 23 psi
 
Note: Filters are prewet – enclosed in a bag filled with DI water and 0.9% H2O2.
 

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