Guardian™ PS UC Liquid Filters
Provides advanced filtration for low temperature, critical, dilute, aqueous and low-high pH cleaning applications at sub-2x nm technology nodes.
●Available with 1 nm or 5 nm retention rating, which improves single-pass retention efficiency, reduces on-wafer defects, and enables higher yield
●An asymmetric membrane ensures tighter particle retention while maintaining high flow rates
●Ultraclean (UC) filtration technology enables less contamination and faster system flush up while extending tool uptime and increasing device yield
Note: Filters are prewet – enclosed in a bag filled with DI water and 0.9% H2O2.
Provides advanced filtration for low temperature, critical, dilute, aqueous and low-high pH cleaning applications at sub-2x nm technology nodes.
●Available with 1 nm or 5 nm retention rating, which improves single-pass retention efficiency, reduces on-wafer defects, and enables higher yield
●An asymmetric membrane ensures tighter particle retention while maintaining high flow rates
●Ultraclean (UC) filtration technology enables less contamination and faster system flush up while extending tool uptime and increasing device yield
Materials | Membrane | Nondewetting polysulfone (PS) |
Supports, sleeve, core, end caps | High-density polyethylene (HDPE) | |
Code 0 double 2-222 O-rings | Encapsulated fluoropolymer (E-FKM) or Kalrez® 6375 | |
Chem-Line™ II disposable outer shell | Polypropylene (PP) and PFA | |
Chem-Line™ I disposable outer shell | PFA | |
Retention rating | 1 nm, 5 nm | |
Membrane surface area |
10” 1 nm: 1.7 m2 (18.30 ft2) 20" 1 nm: 3.4 m2 (36.60 ft2) |
10" 5 nm: 1.6 m2 (17.22 ft2) 20" 5 nm: 3.2 m2 (34.44 ft2) |
Maximum operating conditions |
Maximum forward differential pressure: 0.34 MPa (3.4 bar; 50 psid) @ 25°C (77°F) |
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Maximum reverse pressure: 0.21 MPa (2.1 bar; 30 psi) @ 25°C (77°F) |
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Maximum operating pressure: 0.58 MPa (5.8 bar; 84 psi) @ 25°C (77°F) |
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Maximum operating temperature: 70°C (158°F) @ 23 psi |
Note: Filters are prewet – enclosed in a bag filled with DI water and 0.9% H2O2.