Thermogard™ NE Nitride Etch Cartridge Filters
Increased structural stability for high-temperature and high-viscosity conditions
● For high-temperature and high-viscosity conditions
● High-performance membrane rapidly reduces particle counts
● Unique patented membrane prevents dewetting during installation or chemical dumps/drains and outgassing chemistries
● Nondewetting membrane technology in a prewet filter designed for nitride etch baths and other high-temperature applications
檔案下載：
規格說明：
Increased structural stability for high-temperature and high-viscosity conditions
● For high-temperature and high-viscosity conditions
● High-performance membrane rapidly reduces particle counts
● Unique patented membrane prevents dewetting during installation or chemical dumps/drains and outgassing chemistries
● Nondewetting membrane technology in a prewet filter designed for nitride etch baths and other high-temperature applications
檔案下載：
規格說明：
| Materials: |
Membrane: Nondewetting PTFE packaged in ultrapure DI water Cartridge and disposable supports: PFA Disposable shell: PFA |
| Retention rating: |
0.2 μm |
| Membrane area: |
10”: 9,950 cm2 (10.7 ft2) |
| Maximum operating conditions: |
Maximum operating pressure: 0.58 MPa (5.8 bar; 84 PSI) at 25° C; 0.097 MPa (0.97 bar; 14 PSI) at 180° C Maximum forward differential pressure: 0.14 MPa (4.14 bar; 60 PSID) at 25° C; 0.048 MPa (0.48 bar; 7 PSID) at 180°C Maximum reverse differential pressure: 0.414 MPa (4.14 bar; 60 PSID) @ 25°C Maximum operating temperature: 180°C |
| Performance: |
TOC recovery within 10 ppb of feed after a 120-liter flush at 1 L/min. Resistivity recovery within 0.5 mega-ohm of feed within a 120-liter flush flowing at 1 L/min. Cleanliness: < 25 particles/L >0.5 μm after a 17-minute flush at 12 L/min. |
