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Wafergard® F Cartridge Filters

Wafergard® F Cartridge Filters

For point-of use filtration of photochemicals, photoresists, solvents and other process chemicals


● Stacked Disc Design to Provide Superior Wafergard F filters in both cartridge and disposable types to meet your production needs and ensure clean and safe operation.Downstream Cleanliness
● The stacked-disc filter design eliminates flexing and particle shedding, providing downstream cleanliness in photochemical and photoresist applications.


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規格說明:


Materials:
Membrane: Hydrophobic PTFE membrane made of Teflon fluoropolymer resin
Supports: Halar ECTFE stacked-disc
O-rings: Viton® and EPR, Viton encapsulated with Teflon fluoropolymer resin, Kalrez® perfluoroelastomers or Chemraz®

 
Filtration area:
F-4: 200 cm2 (31 in2)
F-16: 800 cm2 (124 in2)
F-40: 2,000 cm2 (310 in2)

 
Connections:
2-015 or 2-118
 
Operating conditions:
Maximum forward differential pressure: 4 bar (60 PSID, 4 kg/cm2) @ 25°C
Maximum reverse differential pressure: 0.7 bar (10 PSID, 0.7 kg/cm2) @ 25°C
Maximum temperature: 85°C

 
Bubble point integrity testing:
Values are given using N2 and a membrane wet with 60% IPA at 23°C
0.05 μm 2.0 bar (29 PSIG, 2.0 kg/cm2)
0.1 μm  1.5 bar (22 PSIG, 1.5 kg/cm2)
0.2 μm  0.9 bar (13 PSIG, 0.9 kg/cm2)
1.0 μm  0.2 bar (3 PSIG, 0.2 kg/cm2)