Wafergard® F Cartridge Filters
For point-of use filtration of photochemicals, photoresists, solvents and other process chemicals
● Stacked Disc Design to Provide Superior Wafergard F filters in both cartridge and disposable types to meet your production needs and ensure clean and safe operation.Downstream Cleanliness
● The stacked-disc filter design eliminates flexing and particle shedding, providing downstream cleanliness in photochemical and photoresist applications.
Download：
Specifications：
For point-of use filtration of photochemicals, photoresists, solvents and other process chemicals
● Stacked Disc Design to Provide Superior Wafergard F filters in both cartridge and disposable types to meet your production needs and ensure clean and safe operation.Downstream Cleanliness
● The stacked-disc filter design eliminates flexing and particle shedding, providing downstream cleanliness in photochemical and photoresist applications.
Download：
Specifications：
| Materials: |
Membrane: Hydrophobic PTFE membrane made of Teflon fluoropolymer resin Supports: Halar ECTFE stacked-disc O-rings: Viton® and EPR, Viton encapsulated with Teflon fluoropolymer resin, Kalrez® perfluoroelastomers or Chemraz® |
| Filtration area: |
F-4: 200 cm2 (31 in2) F-16: 800 cm2 (124 in2) F-40: 2,000 cm2 (310 in2) |
| Connections: |
2-015 or 2-118 |
| Operating conditions: |
Maximum forward differential pressure: 4 bar (60 PSID, 4 kg/cm2) @ 25°C Maximum reverse differential pressure: 0.7 bar (10 PSID, 0.7 kg/cm2) @ 25°C Maximum temperature: 85°C |
| Bubble point integrity testing: |
Values are given using N2 and a membrane wet with 60% IPA at 23°C 0.05 μm 2.0 bar (29 PSIG, 2.0 kg/cm2) 0.1 μm 1.5 bar (22 PSIG, 1.5 kg/cm2) 0.2 μm 0.9 bar (13 PSIG, 0.9 kg/cm2) 1.0 μm 0.2 bar (3 PSIG, 0.2 kg/cm2) |
