Impact® Asymmetric Disposable Filters
Rapid changeout UPE membrane filters for point-of-use photochemical filtration, including photoresists and solvents. Available in 5 nm and 10 nm retention ratings
● Available in 5 nm retention rating - tightest membrane technology to meet critical line-width processes
● Design optimized for use with the Impact® manifold and IntelliGen® dispense systems; extremely clean for metal ions and extractables
● Minimal chemical exposure, rapid connection design, allows quick filter installation and minimizes downtime while limiting the handling of hazardous chemicals during the installation and disposal processes, thereby promoting a more healthy workplace
● Small footprint allows installation of more filters on tools for advanced systems
● Low holdup volume minimizes chemical waste
● New pleating technology: Impact V2 5 nm and 10 nm products incorporate more membrane within the same 0.03 μm and 0.05 μm Impact V2 filters, providing the footprint and benefits of ultra fine retention without a flow or pressure drop penalty
● Proprietary cleaning technology ensures low metals and organic extractables, eliminating another variable to the customer’s process
Download：
Specifications：
Rapid changeout UPE membrane filters for point-of-use photochemical filtration, including photoresists and solvents. Available in 5 nm and 10 nm retention ratings
● Available in 5 nm retention rating - tightest membrane technology to meet critical line-width processes
● Design optimized for use with the Impact® manifold and IntelliGen® dispense systems; extremely clean for metal ions and extractables
● Minimal chemical exposure, rapid connection design, allows quick filter installation and minimizes downtime while limiting the handling of hazardous chemicals during the installation and disposal processes, thereby promoting a more healthy workplace
● Small footprint allows installation of more filters on tools for advanced systems
● Low holdup volume minimizes chemical waste
● New pleating technology: Impact V2 5 nm and 10 nm products incorporate more membrane within the same 0.03 μm and 0.05 μm Impact V2 filters, providing the footprint and benefits of ultra fine retention without a flow or pressure drop penalty
● Proprietary cleaning technology ensures low metals and organic extractables, eliminating another variable to the customer’s process
Download：
Specifications：
| Materials: |
Membrane: Asymmetric ultra-high molecular-weight polyethylene (UHMWPE) Supports: (upstream, downstream and mold): High-density polyethylene (HDPE) O-ring: Kalrez® perfluoroelastomer |
| Manifold Fittings: |
6.35 mm Flowell® 60 Type 5 mm/3 mm Flowell 60 Type 6 mm/4 mm Flowell 60 Type 4 mm/3 mm Flowell 60 Type 6.35 mm Super Type Pillar® |
| Maximum operating conditions: |
Maximum inlet pressure: 0.34 MPa (3.4 bar, 50 PSI) @ 25°C (77°F) Maximum forward/reverse differential pressure: 0.27 MPa (2.7 bar, 40 PSI) @ 25°C (77°F) Maximum operating temperature: 40°C (104°F) |
| Membrane area: |
1,300 cm2 (1.4 ft2) |
| Holdup volume: |
<=55 cc |
| Compatibility: |
PGMEA, PGME, NMP, ethyl lactate, MMP, and cyclohexanone. Not recommended for use with photochemicals containing aromatic hydrocarbons. |
| Wettability: |
Spontaneously wets in butyl acetate, PGMEA, PGME, ethyl lactate, MMP, ECA, NMP and other photochemical solvents |
