Planargard® CS Bulk Cartridge Filters
Designed to meet the needs of next generation copper and ILD slurries
● Nonwoven depth media design enables filter to retain defect-causing agglomerates with high efficiency
● Excellent retention of agglomerates while allowing consistent, desired “working” slurry particles to reach the wafer surface
● Depth filter greatly reduces the potential for premature filter ‘plugging’
● Available in 0.2 µm, 0.3 µm, 0.5 µm, 0.7 µm, 1.0 µm retention ratings
● Available as a filter cartridge in 5”, 10”, 20” and 30” lengths
● Designed to work with Chemlock® housings
Download：
Specifications：
Designed to meet the needs of next generation copper and ILD slurries
● Nonwoven depth media design enables filter to retain defect-causing agglomerates with high efficiency
● Excellent retention of agglomerates while allowing consistent, desired “working” slurry particles to reach the wafer surface
● Depth filter greatly reduces the potential for premature filter ‘plugging’
● Available in 0.2 µm, 0.3 µm, 0.5 µm, 0.7 µm, 1.0 µm retention ratings
● Available as a filter cartridge in 5”, 10”, 20” and 30” lengths
● Designed to work with Chemlock® housings
Download：
Specifications：
| Materials: |
Filter element: All-polypropylene construction O-ring: EPR |
| Connection: |
Code 0, 2-222 |
| Maximum operating conditions: |
Maximum forward differential pressure: 0.48 MPa (4.8 bar, 70 PSI) at 25°C |
