ProcessGard® NP Cartridge Filters
Depth filters with high flow and excellent broad range retention efficiency, ideal for flat panel display prefiltering and semiconductor Bulk CMP filtration applications
● Multi-stage, graded density design delivers superior particle and gel holding capability
● Superior retention of colloids and particles ensuring low particle counts to protect your process
● Polypropylene construction offers excellent chemical and heat resistance (polypropylene and glass fibers are used for 0.5 μm and 1.0 μm filters)
● A full range of retention ratings with high retention efficiency lets you optimize for your specific process stream
● Applications include wet etching, stripping, developer, cleaning
Download：
Specifications：
Depth filters with high flow and excellent broad range retention efficiency, ideal for flat panel display prefiltering and semiconductor Bulk CMP filtration applications
● Multi-stage, graded density design delivers superior particle and gel holding capability
● Superior retention of colloids and particles ensuring low particle counts to protect your process
● Polypropylene construction offers excellent chemical and heat resistance (polypropylene and glass fibers are used for 0.5 μm and 1.0 μm filters)
● A full range of retention ratings with high retention efficiency lets you optimize for your specific process stream
● Applications include wet etching, stripping, developer, cleaning
Download：
Specifications：
| Materials: |
Membrane: Polypropylene (all 0.5 μm and 1.0 μm filters have some glass fibers included) Supports: Polypropylene supports, cage, core, and sleeves and end caps O-rings: Ethylene propylene (EP) o-ring or gasket standard; Viton® fluoroelastomer, and Teflon® fluoropolymer encapsulated Viton® fluoroelastomer o-ring (TEV) |
| Connection: |
Code 0 (2-222), or Code F (flat gasket) |
| Maximum operating conditions: |
Maximum differential pressure: 0.483 MPa (4.83 bar, 70 PSID) at 25°C Maximum operating temperature: 80°C |
