Wafergard® II F Micro In-Line Gas Filters
Superior particulate filtration for ultrapure gas system filtration
● PTFE membranes provide high efficiency filtration
● Low pressure drop reduces the risk of condensation in low vapor pressure gases
● Excellent compatibility with all classes of semiconductor process gases
● For use with inert and reactive gases, including ozone
● Compact footprint with a maximum diameter of 19.05 mm (0.75")
檔案下載：
規格說明：
Superior particulate filtration for ultrapure gas system filtration
● PTFE membranes provide high efficiency filtration
● Low pressure drop reduces the risk of condensation in low vapor pressure gases
● Excellent compatibility with all classes of semiconductor process gases
● For use with inert and reactive gases, including ozone
● Compact footprint with a maximum diameter of 19.05 mm (0.75")
檔案下載：
規格說明：
| Materials: |
Filter element: Patented Hydrophobic Teflon® PTFE membrane supported by molded Teflon® PFA structure Housing: Electropolished VAR 316L stainless steel Surface finish interior: <=7 μin Ra |
| Helium leak rating: |
Qualified 2`10-10 atm-cc/sec. Tested 1`10-9 atm-cc/sec. |
| Downstream cleanliness: |
Particles: Less than 0.03 particles/liter (<1 particle/ft3 Volatiles: <10 ppb moisture |
| Particle retention: |
Greater than 99.9999999% (9 LRV) removal of all particles at 30 SLPM (referenced at the most penetrating particle size) |
| Removal rating: |
>=0.003 μm |
| Operating conditions: |
Maximum inlet pressure: 207 bar (3000 PSIG) at 23°C (73°F) Maximum forward differential pressure: 4 bar (60 PSID) at 23°C (73°F) Maximum reverse differential pressure: 0.7 bar (10 PSID) at 23°C (73°F) Maximum operating temperature: 120°C (248°F) |
