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Wafergard® II F Micro In-Line Gas Filters

Wafergard® II F Micro In-Line Gas Filters

Superior particulate filtration for ultrapure gas system filtration


● PTFE membranes provide high efficiency filtration
● Low pressure drop reduces the risk of condensation in low vapor pressure gases
● Excellent compatibility with all classes of semiconductor process gases
● For use with inert and reactive gases, including ozone
● Compact footprint with a maximum diameter of 19.05 mm (0.75")


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規格說明:


Materials:
Filter element: Patented Hydrophobic Teflon® PTFE membrane supported by molded Teflon® PFA structure
Housing: Electropolished VAR 316L stainless steel
Surface finish interior: <=7 μin Ra

 
Helium leak rating:
Qualified 2`10-10 atm-cc/sec. Tested 1`10-9 atm-cc/sec.
 
Downstream cleanliness:
Particles: Less than 0.03 particles/liter (<1 particle/ft3
Volatiles: <10 ppb moisture

 
Particle retention:
Greater than 99.9999999% (9 LRV) removal of all particles at 30 SLPM (referenced at the most penetrating particle size)
 
Removal rating:
>=0.003 μm
 
Operating conditions:
Maximum inlet pressure: 207 bar (3000 PSIG) at 23°C (73°F)
Maximum forward differential pressure: 4 bar (60 PSID) at 23°C (73°F)
Maximum reverse differential pressure: 0.7 bar (10 PSID) at 23°C (73°F)
Maximum operating temperature: 120°C (248°F)