Wafergard® II F-40 In-Line Gas Filters
Superior particulate filtration for ultrapure gas systems
● PTFE membranes provide high efficiency filtration
● Low pressure drop reduces the risk of condensation in low vapor pressure gases
● Excellent compatibility with all classes of semiconductor process gases
● For use with inert and reactive gases, including ozone
檔案下載：
規格說明：
Superior particulate filtration for ultrapure gas systems
● PTFE membranes provide high efficiency filtration
● Low pressure drop reduces the risk of condensation in low vapor pressure gases
● Excellent compatibility with all classes of semiconductor process gases
● For use with inert and reactive gases, including ozone
檔案下載：
規格說明：
| Materials: |
Filter element: Patented Hydrophobic Teflon® PTFE membrane supported by molded Halar® ECTFE stacked disc supports with a direct housing seal Housing: Electropolished 316L stainless steel Helium leak rating: Qualified 2`10-10 atm-cc/sec. Tested 1`10-9 |
| Downstream cleanliness: |
Particles1: Less than 0.03 particles/liter (<1 particle/ft3) greater than 0.01 μm Volatiles : <10 ppb moisture at >=5% of rated flow |
| Particle retention: |
Greater than 99.9999999% (9 LRV) removal of all particles at 1500 SLPM (referenced at the most penetrating particle size) |
| Removal rating: |
>=0.003 μm |
| Operating conditions: |
Maximum inlet pressure 18 bar (250 PSIG) at 23°C Maximum forward differential pressure: 4 bar (60 PSID) at 23°C (73°F) Maximum reverse differential pressure: 0.7 bar (10 PSID) at 23°C (73°F) |
