Eximor® SV5 Filter
Advanced-clean, point-of-use filter designed for NTD and RRC solvents. Provides superior contaminant retention capabilities and rapid start-up performance in sub-10 nm technology nodes.
Eximor® SV5 Filter
● Industry: Semiconductor
● Process: Photolithography
● Chemistry: Solvent
● Installation Point: Point of Tool
Product Documentation
Product Specifications
Advanced-clean, point-of-use filter designed for NTD and RRC solvents. Provides superior contaminant retention capabilities and rapid start-up performance in sub-10 nm technology nodes.
Eximor® SV5 Filter
● Industry: Semiconductor
● Process: Photolithography
● Chemistry: Solvent
● Installation Point: Point of Tool
Product Documentation
Product Specifications
| Matrials: | Membrane | PTFE-based |
| Shell, core, supports | PFA | |
| O-ring (OF) | Kalrez® perfluoroelastomer | |
| Maximum operating conditions: | Maximum inlet pressure | 0.39 MPa (3.9 bar, 57 psi) @ 25°C (77°F) |
| Maximum forward/reverse differential pressure | 0.29 MPa (2.9 bar, 42 psi) @ 25°C (77°F) | |
| Maximum operating temperature | 40°C (104°F) | |
| Compatibility: | Compatible with most photochemical solvents, such as nBA, EL, PGMEA, PGME, NMP, etc. Please consult Entegris for more information on chemical compatibility | |
| Hold up volume: |
50 mL |
|
